Etching Solution

SoleChem supplies a comprehensive range of high-purity, electronic-grade etching solutions for the semiconductor, flat panel display, and solar photovoltaic industries. Our etching solution product line includes: Cr Etching Solution for chromium layer patterning in photomask and display manufacturing; Molybdenum Aluminum Molybdenum (Mo/Al/Mo) Etching Solution, a PAN-type etchant for simultaneous patterning of Mo/Al/Mo stacked metal layers in TFT-LCD and AMOLED production; Molybdenum Aluminum (Mo/Al) Etching Solution for dual-layer metal stack etching in backplane processes; Gold Etching Solution for precision gold layer removal in IC packaging and sensor fabrication; ITO Etching Solution for indium tin oxide patterning in touch panels, displays, and transparent conductive film applications; and Aluminum Etching Solution for aluminum metallization etching in semiconductor and display processes. All solutions are supplied as ready-to-use, ultra-pure formulations with trace metal levels controlled to ppb specifications. Available in 4L, 20L, 200L, and 1000L packaging to meet both R&D and high-volume production requirements. Contact us for supply of Etching Solution Request Quote

Key Technical Features

• High Purity Grade standard
• Consistent Batch Quality
• Full Regulatory & REACH Support
• Global Logistics Network enabled