Buffered Oxide Etchant (BOE/BHF)
Description
Buffered Oxide Etchant (BOE), also known as Buffered HF (BHF), is a critical wet etching solution composed of ammonium fluoride and hydrofluoric acid used extensively in semiconductor, flat panel display, photovoltaic, and LED manufacturing. The buffered formulation provides controlled and uniform silicon dioxide etching with superior etch rate stability compared to dilute HF alone. BOE is essential for oxide patterning, pre-diffusion cleaning, and post-CMP oxide removal in advanced device fabrication. The ammonium fluoride buffer maintains consistent fluoride ion concentration throughout the etch process, ensuring predictable etch rates and excellent selectivity to silicon and silicon nitride. Available in multiple ratios (6:1, 7:1, 10:1, 20:1) to match specific process requirements for etch rate and selectivity.
Other Names (Synonyms)
BOE, BHF, Buffered HF, Buffered Hydrofluoric Acid
Key Technical Features
- High Purity Grade standard
- Consistent Batch Quality
- Full Regulatory & REACH Support
- Global Logistics Network enabled