Aluminum Etchant
Description
Aluminum Etchant is a mixed acid formulation of phosphoric acid, nitric acid, and acetic acid designed for selective wet etching of aluminum and aluminum alloy thin films in semiconductor and flat panel display manufacturing. The phosphoric acid provides the primary etch mechanism, while nitric acid serves as an oxidizer and acetic acid acts as a buffer to control etch rate and uniformity. This formulation enables controlled, isotropic etching of aluminum metallization layers with excellent selectivity to underlying dielectric films. Various concentration ratios are available to optimize etch rate, taper angle, and process compatibility for specific device architectures and aluminum alloy compositions.
Other Names (Synonyms)
Al Etchant, PAN Etchant, Phosphoric-Nitric-Acetic Acid Etchant
Key Technical Features
- High Purity Grade standard
- Consistent Batch Quality
- Full Regulatory & REACH Support
- Global Logistics Network enabled